PC控制技术在ALD系统中的应用研究
    点此下载全文
引用本文:徐硕1,2,张轩雄1,明帅强2,3.PC控制技术在ALD系统中的应用研究[J].计算技术与自动化,2023,(4):9-13
摘要点击次数: 108
全文下载次数: 0
作者单位
徐硕1,2,张轩雄1,明帅强2,3 (1.上海理工大学上海 2000932.嘉兴科民电子设备技术有限公司浙江 嘉兴 3140063.中国科学院微电子研究所仪器设备研发中心北京 100029) 
中文摘要:针对当前国内原子层沉积(ALD)控制系统中存在硬件结构兼容性较差、数据交换及数据处理能力较弱等问题。通过分析ALD薄膜生长工艺特点,选定系统硬件配件,确定系统控制结构,设计出基于PC控制的ALD系统。系统采用Beckhoff工业PC作为主控制器,运用EtherCAT现场总线技术进行控制器与I/O模块之间的数据传输与交换,利用TwinCAT控制软件控制整个系统的运行。新系统在现场运行结果表明:该系统功能完善,实时性强,运行稳定,工艺结果能够达到半导体薄膜工艺标准。基于PC控制的ALD系统,对于实现薄膜生长的自动化具有重要意义,为PC控制应用于薄膜生长提供了指导。
中文关键词:原子层沉积  PC控制  EtherCAT  TwinCAT
 
Application of PC Control Technology in ALD System
Abstract:Aiming at the problems of poor hardware structure compatibility, weak data exchange and data processing ability in current domestic atomic layer deposition (ALD) control system. By analyzing the characteristics of ALD thin film growth process, the hardware components of the system are selected, the system control structure is determined, and the ALD system based on PC control is designed. The system uses Beckhoff industrial PC as the main controller, uses EtherCAT fieldbus technology to transfer and exchange data between the controller and I/O module, and uses TwinCAT control software to control the operation of the whole system. The field operation results of the new system show that the system has perfect function, strong real-time performance and stable operation, and the process results can meet the semiconductor film process standard. The ALD system based on PC control is of great significance to realize the automation of film growth, and provides guidance for the application of PC control in film growth.
keywords:atomic layer deposition  PC control  EtherCAT  TwinCAT
查看全文   查看/发表评论   下载pdf阅读器